Ion Implantation

What we offer

This is a process by which ions of a material are accelerated in an electrical field and impacted into a solid, typically silicon wafers. This process is used to change the physical, chemical, or electrical properties of the silicon wafer used in semiconductor device fabrication of products such as Dram and Cmos. ASCT is focused on providing our customers with new parts, our VIIP impregnation process as well as our cleaning services that will eliminate particle generation as die sizes continue to shrink.